光学材料表征一书提供了关于在不同表征技术影响下理解光学材料的性能与特性方面的知识。表面与界面性质对材料的光响应是非常重要的，为实现所需性能在材料加工过程中对他们进行控制与修饰是必要的。《光学材料的表征》(作者布伦德尔、埃文斯、伊莎霍斯)一书集中介绍了表面形貌、微观结构及化学键是如何影响材料的光响应，它介绍了用于表征薄膜、多层结构与改性表面的方法。

《光学材料的表征》内容介绍：Characterization in Optica/ Materia/s provides information for understanding the properties and performance of optical materials under the influence of the various characterization techniques. Surface and interfacial properties are key to the optical response of a material,and their control and modification during materials processing is necessary to achieve desired behaviorCharacterization of Optica/ Materia/s focuses on how surface morphology,microstructure,and chemical bonding influence the optical response of a material,and it illuminates methods used to characterize thin films,multilayer structures,and modified surfaces.

《光学材料的表征》的作者是布伦德尔、埃文斯、伊莎霍斯。

Preface to the Reissue ofthe Materials Characterization Series

Preface to Series

Preface to the Reissue of Characterization of Optical Materials

Preface

Contributors

INTRODUCTION

PART 1 INFLUENCE OF SURFACEMORPHOLOGYAND

MICROSTRUCTURE ON OPTICAL RESPONSE

CHARACTERIZATION OF SURFACE ROUGHNESS

1.1 Introduction

1.2 WhatSurfaceRoughnessls

1.3 HowSurfaceRoughness AffctsOpticaIMeasurements

1.4 How Surface Roughness and ScatteringAre Measured

1.5 Characterization ofSelected Surfaces

1.6 Future Difections

CHARACTERIZATION OF THE NEAR-SURFACE REGION USING POIARIZATION-SENSITIVE OPTICAL TECHNIQUES

2.1 Introduction

2.2 Ellipsometry

ExperimentallmplementationsofEllipsometry 29, Analysisof

EllipsometryData

2.3 MicrostructuralDeterminationsfromEllipsometryData

Temperature Dependence ofthe Opticat Properties ofSilicon 34,

Determination ofthe Optical Functions ofGlasses Using SE 35,

SpectroscopicEllipsometryStudiesofSi02/Si 37, Spectroscopic

EllipsometryforComplicatedFilmStrucrures 38, Time-Resolved

Ellipsometry 40, Single-WavelengthReal-TimeMonitoringofFilm

Growth 41, Multiple-WavelengthReal-TimeMonitoringofFilm

Growth 42, Infrared EllipsometryStudies ofFilm Growth

THE COMPOSITION, STOICHIOMETRY, AND RELATED MICROSTRUCTURE OF OPTICAL MATERIALS

3.1 Introduction

3.2 AspectsofRamanScattering

3.3 III-VSemiconductor Systems

3.4 GroupIVMaterials

3.5 Amorphous and Microcrystalline Semiconductors

ChalcogenideGlasses 60, GroupIVMicrocrystallineSemiconductors

3.6 Summary

DIAMOND AS AN OPTICAL MATERIAL

4.1 Introduction

4.2 DepositionMethods

4.3 0pticalPropertiesofCVD Diamond

4.4 Defectsin CVD Diamond

4.5 PolishingCVD Diamond

4.6 X-rayWindow

4.7 Summary

PART 2 STABILITY AND MODIFICATION OF FILM AND SURFACE OPTICAL PROPERTIES

MULTIJAYER OPTICAL COATINGS

5.1 Introduction

5.2 Single-LayerOpticalCoatings

OpticaIConstants 90, CompositionMeasurementTechniques

5.3 MultilayerOpticalCoatings

CompositionaIAnalysis 107, SurfaceAnalyticaITechniques 108,

MicrostructuralAnalysis ofMultilayer Optical Coatings

5.4 StabilityofMultilayerOpticalCoatings

5.5 Future Compositional and

MicrostructuralAnalyticaITechniques

CHARACTERIZATION AND CONTROL OF STRESS IN OPTICAL FILMS

6.1 Introduction

6.2 0rigins ofStress

6.3 Techniques for Modifying or Controlling

Film Stress 124

Effect of Deposition Parameters 124, Effect of Ion-Assisted

Deposition 127, Effect of Impurities 127, Effect of Post

Deposition Annealing 128

6.4 Stress Measurement Techniques 130

Substrate Deformation 130, X-Ray Diffraction (XRD) 133,

Raman Spectroscopy 134

6.5 Future Directions 136

SURFACE MODIFICATION OF OPTICAL MATERIALS

7.1 Introduction 141

7.2 Fundamental Processes 142

Ion-Solid Interactions 142, Defect Production, Rearrangement,

and Retention 143

7.3 Ion Implantation of Some Optical Materials 145

Glasses and Amorphous Silica 145, Ix-Quartz (SiO2) 147,

Halides 148, Sapphire (Ix-A1203) 149, LiNbO3 152,

Preparation of Optical Components by Ion Implantation 153

LASER-INDUCED DAMAGE TO OPTICAL MATERIALS

8.1 Introduction 157

8.2 Laser Damage Definition and Statistics 158

Defining Damage 158, Collecting Damage Statistical Data 159,

Types of Damage Probability Distributions 160, Identification of

Pre-Damage Sites 160, Changing the Damage Threshold 161

8.3 In Situ Diagnostics 165

Photothermal Techniques 165, Particle Emission 168

8.4 Postmortem Diagnostics 170

Surface Charge State 170, Surface Phase and Structure Analysis_ "171

8.5 Future Directions 174

APPENDIX~ TECHNIQUE SUMMARIES

1 Auger Electron Spectroscopy (AES) 181

2 Cathodoluminescence(CL) 182

3 Electron Energy-Loss Spectroscopy

in the Transmission Electron Microscope (EELS) 183

4 Energy-Dispersive X-Ray Spectroscopy (EDS) 184

5 Fourier Transform Infrared Spectroscopy (FTIR) 185

6 Light Microscopy 186

7 Modulation Spectroscopy 187

8 Nuclear Reaction Analysis (NRA) 188

9 0pticalScatterometry 189

10 Photoluminescence (PL) 190

11 Photothermal Displacement Technique 191

12 Raman Spectroscopy 193

13 Rutherford Backscattering Spectrometry (RBS) 194

14 Scanning Electron Microscopy (SEM) 195

15 Scanning Transmission

Electron Microscopy (STEM) 196

16 Scanning Tunneling Microscopy

and Scanning Force Microscopy (STM and SFM) 197

17 Static Secondary Ion

Mass Spectrometry (Static SIMS) 198

18 Surface Roughness: Measurement, Formation by

Sputtering, Impact on Depth Profiling 199

19 Total Internal Reflection Microscopy 200

20 Transmission Electron Microscopy (TEM) 202

21 Variable-Angle Spectroscopic Ellipsometry (VASE) 203

22 X-Ray Diffraction (XRD) 204

23 X-Ray Fluorescence (XRF) 205

24 X-Ray Photoelectron Spectroscopy (XPS) 206

Index 207